IMEC collaborates with Mitsui Chemical to promote the commercialization of EUV carbon nanotube photomask films
The Belgian Microelectronics Research Center (IMEC) announced in December that it has signed a strategic cooperation agreement with Mitsui Chemical of Japan to jointly promote the commercialization of EUV carbon nanotube photomask film (pellicle) technology. According to the agreement, Mitsui Chemical will integrate IMEC's carbon nanotube (CNT) particle based technology with Mitsui Chemical's thin film related technology, with the goal of introducing this new product into high-power EUV systems between 2025 and 2026.
According to the official introduction of IMEC, the photomask dustproof film (pellicle) is used to protect the cleanliness of photomasks, requiring high transmittance and long lifespan. Carbon nanotube particles (CNTs) can improve the performance of ultra-thin films during EUV (extreme ultraviolet) exposure, with extremely high EUV transmittance (≥ 94%), extremely low EUV reflectance, and minimal optical impact, all of which are key characteristics for achieving high production capacity in advanced semiconductor manufacturing. In addition, carbon nanotube particles can withstand EUV power of over 1kW, thus meeting the needs of future next-generation lithography machines. This technology has aroused strong interest in the industry, so both parties will jointly develop industrial grade carbon nanotube particles to meet market demand.
The principle of dustproof film Pellicle, from Mitsui Chemical
Steven Scheer, Senior Vice President of IMEC, stated that the organization has long supported the semiconductor ecosystem in advancing the lithography technology roadmap. Since 2015, IMEC has been collaborating with the supply chain to develop innovative thin film designs based on carbon nanotubes (CNTs) for advanced EUV lithography technology. He said, "We believe that a deeper understanding of the metrology, characterization, properties, and properties of carbon nanotube films will accelerate the development of Mitsui Chemical products. We hope to jointly put carbon nanotube particles into production for future generations of EUV lithography technology."
Steven Scheer, Senior Vice President of IMEC, stated that the organization has long supported the semiconductor ecosystem in advancing the lithography technology roadmap. Since 2015, IMEC has been collaborating with the supply chain to develop innovative thin film designs based on carbon nanotubes (CNTs) for advanced EUV lithography technology. He said, "We believe that a deeper understanding of the metrology, characterization, properties, and properties of carbon nanotube films will accelerate the development of Mitsui Chemical products. We hope to jointly put carbon nanotube particles into production for future generations of EUV lithography technology."
According to the lithography industry roadmap, the next generation of ASML 0.33NA (numerical aperture) EUV lithography systems will support light sources with a power level of 600W or higher from 2025 to 2026. At that time, new photomask dustproof films will also be commercialized, which can be used for mass production of chips with processes of 2nm and below.